Abstract
A novel fabrication of hierarchically ordered organic and inorganic hybrid structures at length scales ranging from nanometers to micrometers was demonstrated by oxygen plasma treatment of self-organized silicon-containing block copolymer films. The rod-coil type silicon-containing block copolymer, polystyrene-b-polyisoprene with polyhedral oligomeric silsesquioxane (POSS) -modified side chains, was successfully synthesized by hydrosilation of polystyrene-b-poly(1,2-ran-3,4-isoprene) block copolymer with hydrido-heptacyclopentyl substituted POSS. The films were prepared from the polymer solution by casting on silicon wafers under a moist air flow. The self-organized microstructures were investigated by electron microscopy. It was found that the hexagonally packed micropores and phase-separated nanodomains were formed within the films. Oxygen plasma etching of the films provided novel hierarchically ordered hybrid structures.
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Hayakawa, T., Seino, M., Goseki, R. et al. Fabrication of Hierarchically Ordered Hybrid Structures over Multiple Length Scales via Direct Etching of Self-Organized Polyhedral Oligomeric Silsesquioxane (POSS) Functionalized Block Copolymer Films. Polym J 38, 567–576 (2006). https://doi.org/10.1295/polymj.PJ2005140
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DOI: https://doi.org/10.1295/polymj.PJ2005140