Correction to: Light: Science & Applications (2012) 1, e30; doi:10.1038/lsa.2012.30
This article, published on 28 September, should have been published with an accompanying supplementary information video file online.
This supplementary information file is now been published with erratum; we apologize for the omission.
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The online version of the original article can be found at 10.1038/lsa.2012.30
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Edwards, C., Arbabi, A., Popescu, G. et al. Erratum: Optically monitoring and controlling nanoscale topography during semiconductor etching. Light Sci Appl 1, e44 (2012). https://doi.org/10.1038/lsa.2012.44
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DOI: https://doi.org/10.1038/lsa.2012.44